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1 article(s) from Ognev, Alexey

Fabrication of high-resolution nanostructures of complex geometry by the single-spot nanolithography method

Alexander Samardak,
Margarita Anisimova,
Aleksei Samardak and
Alexey Ognev

Beilstein J. Nanotechnol. 2015, 6, 976–986, doi:10.3762/bjnano.6.101

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Figure 1: SEM images demonstrating the effect of substrate on the single-spot overexposure of a ring at a dos...

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Figure 2: Single-spot overexposure of a ring dependening on the substrate type: (a) a single-crystal Si subst...

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Figure 3: Effect of the exposure dose and substrate material on the single-spot pattern formation: (a) the ri...

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Figure 4: (a,c) Monte Carlo simulation of 250 electron scattering trajectories at 10 keV incident energy in a...

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Figure 5: AFM images of the ring, patterned on the silicon substrate coated by a 120 nm thick PMMA A2 resist:...

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Figure 6: Dependence of d_out (a) and d_in (b) on the exposure dose at an acceleration voltage of 10 kV for dif...

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Figure 7: SEM images demonstrating the effect of changing the d_s between the electron beam spots with a dose ...

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Figure 8: Polymer nanostructures fabricated on a PMMA A2 resist of 75 nm thickness at an acceleration voltage...

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Figure 9: Effect of the acceleration voltage on the formation of polygons on Si (a–c) and Au (d–f) substrates...

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Figure 10: (a,b) Electron energy distribution in a 75 nm thick PMMA layer on a bulk Si substrate at 15 and 20 ...

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Figure 11: 3D AFM images of polymer nanostructures fabricated on PMMA A2 resist with thickness of 75 nm on Si ...

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Figure 12: Demonstration of the proximity effect using nanostructures fabricated on a PMMA A2 resist with a th...

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Figure 13: An example of a complex polymer pattern with a minimum line width of 15 nm fabricated at an acceler...

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Figure 14: SEM images of Co nanostructures formed on the pre-patterned Si substrate: (a) circle, (b) double ci...

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Full Research Paper

Published 17 Apr 2015

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